三氟化硼纯化技术研究进展.pdf

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进展
2012年第31卷第12期
CHEMICAL INDUSTRY AND ENGNEERING PROGRESS
2603
进展与述评
三氟化硼纯化技术研究进展
张卫江,李波,徐姣,王楠楠
(天津大学化工学院,天津300072)
摘要:三氟化硼气体是半导体离子注入的重要离子掺杂源。为了达到电子级气体純度的要求,三氟化硼气体
的纯化技术研究具有重要意义。文中对三氟化硼气体的纯化工艺技术,即冷阱法、低温精馏法、选择性吸附法
化学转化法和多种工艺耦合联用进行了对比,分析各种工艺的优缺点:冷阱法操作简便,成本低,但纯度不够;
低温精馏法分离效果好,但能耗大,操作条件要求比较严格;选择性吸附和化学转化法操作简易,设备安全,
但吸附剂性能不太稳定,吸附效率有待提高。结合高丰度三氟化硼气体的纯化除杂背景,重点介绍选择吸附与
低温精馏耦合联用工艺,纯化后的三氟化明气体纯度可以达到99.995%。提出冷阱、物理吸附、化学转化以及精
留结合的方法,得到的高纯气体可以应用于电子工业领城
关键词:电子气体;三氟化硼;纯化;低溫精馏;吸附
中图分类号:TQ028.1
文献标志码:A文章编号:1000-6613(2012)12-2603-06
Research advances in purification technologies for boron trifluoride
ZIANG Weijiang, LI Bo, XU Jiao, WANG Nannan
School of Chemical Engineering and Technology, Tianjin University, Tianjin 300072, China)
Abstract: Boron trifluoride is an important doping ion source for semiconductor ion implantation. In
order to achieve electronic level requirements, purification technologies for boron trifluoride have been
paid more attention. The commonly used purification methods were compared, such as cold trap,
cryogenic rectification, selective adsorption, chemical conversion and combined methods. Cold trap
technology had the superiorities of simple operation and low cost, but the amount of impurities from it
was high. Cryogenic rectification had better separation result, but its energy consumption was large and
operating conditions were strict Selective adsorption and chemical conversion technologies had simple
conditions, however, the performance of the adsorbent was not stable and the adsorption efficiency
needs to be improved. Based on the purification background of high abundance boron trifluoride, the
selective adsorption and cryogenic rectification combined method was emphasized. The purity of boron
trifluoride obtained was not less than 99.995%. At last, a combined technology of cold trap, adsorption
and cryogenic rectification was proposed. The purified gas obtained from it could be applied to
electronics industry
Key words: electronic gas; boron trifluoride; purification; cryogenic rectification; adsorption
电子特种气体是指集成电路制造中所用的材注入过程的P型掺杂源。高纯BF3作为硼掺杂剂
料气体和高纯气体,可广泛应用于薄膜、刻蚀
掺杂气相沉积、扩散等工艺。
收稿日期:2012-06-14;修改稿日期:2012-08-10
高纯BF3气体在工业生产上的有很多方面的应第一作者:张卫江(951-,男,研究员,主要从事传质与分离过程
用,可以用于电子工业和光纤工业,可作为制备光
以及环境工程中氮氧化物尾气处理、锅炉脱硫除尘、污水处理等研究
工作。E-mailwjzh(@tju.edu.cn。联系人:徐姣,副研究员。E-mai
纤预制件的原料,并且是硅和皆外延、扩散和离子 xujiaohh@le63com